Why do aromatic interactions matter of compound: 484-47-9

This compound(2,4,5-Triphenylimidazole)Name: 2,4,5-Triphenylimidazole was discussed at the molecular level, the effects of temperature and reaction time on the properties of the compound were discussed, and the optimum reaction conditions were selected.

Name: 2,4,5-Triphenylimidazole. The mechanism of aromatic electrophilic substitution of aromatic heterocycles is consistent with that of benzene. Compound: 2,4,5-Triphenylimidazole, is researched, Molecular C21H16N2, CAS is 484-47-9, about Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist. Author is Pranda, Adam; Lin, Kang-Yi; Engelmann, Sebastian; Bruce, Robert L.; Joseph, Eric A.; Metzler, Dominik; Oehrlein, Gottlieb S..

In this work, the authors evaluated the ability of an at. layer etching (ALE) process to maximize the SiO2/EUV PR etching selectivity. Through the flexible parameter space available in an ALE process, the authors evaluated the etching behaviors as a function of the ALE parameters of ion energy, etch step length, fluorocarbon (FC) deposition thickness, and precursor gas type. The authors found that the interaction between the energetic argon ion bombardment and a deposited FC layer produces a modified surface layer on the PR material that can strongly control the PR etch rate and even produce an etch stop under some conditions. Secondary characterization using XPS and at. force microscopy was used to support the conclusions derived from the ellipsometric modeling based on the surface chem. evolution and determine the impact of the ALE process on the surface roughness of the EUV PR, resp. Addnl., attenuated total reflection Fourier-transform IR spectroscopy was used to track the impact on specific functional groups within the PR composition from both the argon ion bombardment and FC deposition components of the ALE process. The ALE-based PR etching concept established in this work serves as a foundation for both the understanding of the impacts of an ALE process on an EUV PR material and for future works, employing an ALE process for PR-based pattern transfer. (c) 2020 American Institute of Physics.

This compound(2,4,5-Triphenylimidazole)Name: 2,4,5-Triphenylimidazole was discussed at the molecular level, the effects of temperature and reaction time on the properties of the compound were discussed, and the optimum reaction conditions were selected.

Reference:
Nitrile – Wikipedia,
Nitriles – Chemistry LibreTexts